ISO/TR 22335:2007

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Опубликовано (Версия 1, 2007)

Последний раз этот публикация был пересмотрен в 2020. Поэтому данная версия остается актуальной.

ISO/TR 22335:2007

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Тезис

ISO/TR 22335:2007 describes a method for determining ion-sputtering rates for depth profiling measurements with Auger electron spectroscopy (AES) and X‑ray photoelectron spectroscopy (XPS) where the specimen is ion-sputtered over a region with an area between 0,4 mm² and 3,0 mm². The Technical Report is applicable only to a laterally homogeneous bulk or single-layered material where the ion-sputtering rate is determined from the sputtered depth, as measured by a mechanical stylus profilometer, and sputtering time.

The Technical Report provides a method to convert the ion-sputtering time scale to sputtered depth in a depth profile by assuming a constant sputtering velocity. This method has not been designed for, or tested using, a scanning probe microscope system. It is not applicable to the case where the sputtered area is less than 0,4 mm² or where the sputter-induced surface roughness is significant compared with the sputtered depth to be measured.

Общая информация

Текущий статус
: Опубликовано

Дата публикации
: 2007-07

Этап
: Подтверждение действия международного стандарта [90.93]
Версия
: 1
Технический комитет :
ISO/TC 201/SC 4

ICS :
71.040.40
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