ISO/FDIS 8181

Тезис

This document defines the terms involved in atomic layer deposition technology and the corresponding applications. The basis of atomic layer deposition and the physical and chemical properties of thin films, as well as their detection methods are included. The terms in corresponding applications of thin films via atomic layer deposition are defined, such as microelectronics, photovoltaics, display, energy and catalysis.

Общая информация

Текущий статус
: Under development
Версия
: 1
Технический комитет
: ISO/TC 107 Metallic and other inorganic coatings
ICS
:
01.040.25 Manufacturing engineering (Vocabularies)

25.220.01 Surface treatment and coating in general