Reference number
ISO 23170:2022
International Standard
ISO 23170:2022
Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
Edition 1
2022-06
Read sample
ISO 23170:2022
74814
Published (Edition 1, 2022)

ISO 23170:2022

ISO 23170:2022
74814
Language
Format
CHF 151
Convert Swiss francs (CHF) to your currency

Abstract

This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).

General information

  •  : Published
     : 2022-06
    : International Standard published [60.60]
  •  : 1
     : 29
  • ISO/TC 201/SC 4
    71.040.40 
  • RSS updates

Got a question?

Check out our Help and Support