International Standard
ISO 21466:2019
Microbeam analysis — Scanning electron microscopy — Method for evaluating critical dimensions by CD-SEM
Reference number
ISO 21466:2019
Edition 1
2019-12
© ISO 2024
International Standard
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Published (Edition 1, 2019)

ISO 21466:2019

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Language
CHF 173
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Abstract

This document specifies the structure model with related parameters, file format and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the model-based library (MBL) method. The method is applicable to linewidth determination for specimen, such as, gate on wafer, photomask, single isolated or dense line feature pattern down to size of 10 nm.

General information

  • Status
     : Published
    Publication date
     : 2019-12
    Stage
    : International Standard published [60.60]
  • Edition
     : 1
    Number of pages
     : 47
  • Technical Committee :
    ISO/TC 202/SC 4
    ICS :
    37.020 
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